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DSA materials and processes development for ≤ P24 EUV res... | ResearchHub
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DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification
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Authors
Eungnak Han
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Eungnak Han
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Gurpreet Singh
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•
Florian Gstrein
Published
April 10, 2024
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Topics
Computer Science
Materials Science
Mathematics
Physics
Engineering
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DOI
10.1117/12.3012612
