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Application of clean oxidation technology using H2O2 for ... | ResearchHub
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Application of clean oxidation technology using H2O2 for simultaneous removal of sulfur and organic substances in the Bayer process
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Authors
Mengnan Li
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Mengnan Li
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Zhanwei Liu
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•
Shuxin Liu
Published
July 1, 2024
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Journal
Hydrometallurgy
Topics
Computer Science
Organic Chemistry
Chemistry
Engineering
Environmental Chemistry
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DOI
10.1016/j.hydromet.2024.106367
