Paper
Paper
Search...
Search ResearchHub...
Ctrl+K
New
Home
Browse
Earn
Fund
RH Journal
Notebook
Lists
Leaderboard
RSC
USD
Changelog
Terms
Privacy
Issues
Docs
Support
Foundation
About
Application of clean oxidation technology using H2O2 for ... | ResearchHub
Paper
Paper
Search...
Search ResearchHub...
Ctrl+K
New
Home
Browse
Earn
Fund
RH Journal
Notebook
Lists
Leaderboard
RSC
USD
Changelog
Terms
Privacy
Issues
Docs
Support
Foundation
About
Application of clean oxidation technology using H2O2 for simultaneous removal of sulfur and organic substances in the Bayer process
0
Authors
Mengnan Li
4 more
Mengnan Li
•
Zhanwei Liu
2 more
•
Shuxin Liu
Published
July 1, 2024
Paper
Conversation
0
Reviews
0
Bounties
0
Sign in to comment
Add a comment...
Best
Supporters
Support the authors with ResearchCoin
Tip RSC
Journal
Hydrometallurgy
Topics
Computer Science
Organic Chemistry
Chemistry
Engineering
Environmental Chemistry
Show all topics
DOI
10.1016/j.hydromet.2024.106367
