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Stochastic Simulation Study of Pattern Formation in EUV r... | ResearchHub
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Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers
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Authors
Kyohei Imai
3 more
Kyohei Imai
•
Bunta Inoue
1 more
•
Masaaki Yasuda
Published
May 30, 2024
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Journal
Journal of Photopolymer Science and Technology
Topics
Physics
Materials Science
Chemistry
Optics
Electrical And Electronic Engineering
Show all topics
DOI
10.2494/photopolymer.37.109
Other Formats
PDF
Supporters
Support the authors with ResearchCoin
Tip RSC
Journal
Journal of Photopolymer Science and Technology
Topics
Physics
Materials Science
Chemistry
Optics
Electrical And Electronic Engineering
Show all topics
DOI
10.2494/photopolymer.37.109
Other Formats
PDF
