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Gate oxide reliability: upcoming trends, challenges, and opportunities
Electrical And Electronic Engineering
Computer Science
Physics
Show More
Authors
Ben Kaczer
,
R. Degraeve
J. Franco
,
Tibor Grasser
,
Ph. Roussel
,
E. Bury
,
Pieter Weckx
,
Adrian Chasin
,
Stanislav Tyaginov
,
Michiel Vandemaele
,
Alexander Grill
,
Barry O’Sullivan
,
J. Fortuny
,
Pablo Canflanca
,
Michael Waltl
,
Pietro Rinaudo
,
Ying Zhao
,
Emily Kao
,
Ruben Asanovski
,
E. Catapano
,
Arthur Beckers
,
Andrea Vici
,
B. Truijen
,
Y. Higashi
,
Sergiu Clima
,
Yang Xiang
,
D. Sangani
,
L. Panarella
,
Quentin Smets
,
Theresia Knobloch
,
Dominic Waldhoer
,
Benoît Troeye
,
Yuanxiong Guo
,
Anastasiia Kruv
,
K. Viswakarma
,
Mario González
+34 authors
,
D. Linten
Published
Jun 15, 2024
DOI
10.1109/snw63608.2024.10639245
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