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Molecular Dynamics Simulation of Pattern Formation for Ne... | ResearchHub
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Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography
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Authors
K Yamada
3 more
K Yamada
•
Kaito Yamada
1 more
•
Masaaki Yasuda
Published
May 30, 2024
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Journal
Journal of Photopolymer Science and Technology
Topics
Physics
Materials Science
Chemistry
Chemical Physics
Quantum Mechanics
Show all topics
DOI
10.2494/photopolymer.37.75
Other Formats
PDF
Supporters
Support the authors with ResearchCoin
Tip RSC
Journal
Journal of Photopolymer Science and Technology
Topics
Physics
Materials Science
Chemistry
Chemical Physics
Quantum Mechanics
Show all topics
DOI
10.2494/photopolymer.37.75
Other Formats
PDF
