Paper
Paper
Search...
Search ResearchHub...
Ctrl+K
New
Home
Browse
Earn
Fund
RH Journal
Notebook
Lists
Leaderboard
RSC
USD
Changelog
Terms
Privacy
Issues
Docs
Support
Foundation
About
Molecular Dynamics Simulation of Pattern Formation for Ne... | ResearchHub
Paper
Paper
Search...
Search ResearchHub...
Ctrl+K
New
Home
Browse
Earn
Fund
RH Journal
Notebook
Lists
Leaderboard
RSC
USD
Changelog
Terms
Privacy
Issues
Docs
Support
Foundation
About
Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography
0
Authors
K Yamada
3 more
K Yamada
•
Kaito Yamada
1 more
•
Masaaki Yasuda
Published
May 30, 2024
Paper
Conversation
0
Reviews
0
Bounties
0
Sign in to review
Share your thoughts on this paper...
Best
Supporters
Support the authors with ResearchCoin
Tip RSC
Journal
Journal of Photopolymer Science and Technology
Topics
Physics
Materials Science
Chemistry
Chemical Physics
Quantum Mechanics
Show all topics
DOI
10.2494/photopolymer.37.75
Other Formats
PDF
Supporters
Support the authors with ResearchCoin
Tip RSC
Journal
Journal of Photopolymer Science and Technology
Topics
Physics
Materials Science
Chemistry
Chemical Physics
Quantum Mechanics
Show all topics
DOI
10.2494/photopolymer.37.75
Other Formats
PDF
