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Intralayered Ostwald Ripening to Ultrathin Nanomesh Catal... | ResearchHub
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Intralayered Ostwald Ripening to Ultrathin Nanomesh Catalyst with Robust Oxygen‐Evolving Performance
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Authors
Junfeng Xie
7 more
Junfeng Xie
•
Bicai Pan
5 more
•
Yi Xie
Published
January 6, 2017
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Journal
Advanced Materials
Topics
Chemistry
Materials Science
Engineering
Electrochemistry
Chemical Engineering
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DOI
10.1002/adma.201604765
