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Resolving nanoscale composition fluctuations and defects in advanced interconnects: a crucial step to comprehend thin film resistivity
Electrical And Electronic Engineering
Electronic, Optical And Magnetic Materials
Materials Science
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Authors
Claudia Fleischmann
,
Akira Uedono
Jeroen Scheerder
,
Jean-Philippe Soulié
,
S. Park
,
Christoph Adelmann
+4 authors
,
Zsolt Tőkei
Published
Jun 3, 2024
DOI
10.1109/iitc61274.2024.10732594
Posted by
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