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Enhanced Ferroelectricity and Reliability in Sub-6 nm Fer... | ResearchHub
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Enhanced Ferroelectricity and Reliability in Sub-6 nm Ferroelectric Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 Stack Film Compatible with BEOL Process
0
Authors
Yinchi Liu
9 more
Yinchi Liu
•
Jining Yang
7 more
•
Wen-Jun Liu
Published
November 13, 2024
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Journal
ACS Applied Electronic Materials
Topics
Physics
Materials Science
Chemistry
Environmental Chemistry
Materials Chemistry
Show all topics
DOI
10.1021/acsaelm.4c01745
