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Sustainable Lithography Paradigm Enabled by Mechanically ... | ResearchHub
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Sustainable Lithography Paradigm Enabled by Mechanically Peelable Resists
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Authors
Lei Chen
10 more
Lei Chen
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Jianfei Xie
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•
Huigao Duan
Published
November 26, 2024
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Journal
Advanced Materials
Topics
Engineering
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DOI
10.1002/adma.202410978