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Deposition and characterization of Ti2AlC MAX phase and T... | ResearchHub
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Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering
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Authors
Ranran Su
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Ranran Su
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Hongliang Zhang
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•
Haibin Zhang
Published
May 16, 2016
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Journal
Materials Letters
Topics
Chemistry
Materials Science
Organic Chemistry
Materials Chemistry
Crystallite
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DOI
10.1016/j.matlet.2016.05.086
