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Pattern distortion in nanoimprint lithography using UV-cu... | ResearchHub
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Pattern distortion in nanoimprint lithography using UV-curable polymer stamps
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Authors
Fangfang Li
6 more
Fangfang Li
•
Marina Fetisova
4 more
•
Markku Kuittinen
Published
November 1, 2024
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Journal
Micro and Nano Engineering
Topics
Medicine
Materials Science
Pathology
Biomedical Engineering
Electrical And Electronic Engineering
Show all topics
DOI
10.1016/j.mne.2024.100293
License
CC-BY
Supporters
Support the authors with ResearchCoin
Tip RSC
Journal
Micro and Nano Engineering
Topics
Medicine
Materials Science
Pathology
Biomedical Engineering
Electrical And Electronic Engineering
Show all topics
DOI
10.1016/j.mne.2024.100293
License
CC-BY
