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A new alternative illumination system for extreme ultravi... | ResearchHub
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A new alternative illumination system for extreme ultraviolet mask inspection based on Fourier synthesis technology
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Authors
Shuying Deng
8 more
Shuying Deng
•
Fanqiang Meng
6 more
•
Zhou Zhou
Published
January 7, 2025
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Journal
Optics Express
Topics
Computer Science
Materials Science
Physics
Quantum Mechanics
Optics
Show all topics
DOI
10.1364/oe.541428
License
CC-BY
Supporters
Support the authors with ResearchCoin
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Journal
Optics Express
Topics
Computer Science
Materials Science
Physics
Quantum Mechanics
Optics
Show all topics
DOI
10.1364/oe.541428
License
CC-BY
