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Impact of 12nm FinFET Technology Variations on TID Effects: A Comparative Study of GF 12LP and 12LP+ at the Transistor Level

Authors
Aldo VidanaNathaniel DoddsHugh Barnaby
Journal
IEEE Transactions on Nuclear Science
Published
January 1, 2025
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Topics

DOI

10.1109/tns.2025.3528186

License

Unknown License
Impact of 12nm FinFET Technology Variations on TID Effect... | ResearchHub